FACULTY OF ENGINEERINGDEPARTMENT OF METALLURGICAL AND MATERIALS ENGINEERING


Yener Kuru (2016)

Assoc. Prof. Dr. Yener Kuru (2016)
Education: 

Research Experiences:Max Planck Institute for Solid State Research (2008-2010), MIT (2010-2012)

Ph.D.: 2008 –Max Planck Institute for Metals Research and Stuttgart University, Germany

M.S.: 2004 – Sabanci University, Turkey

B.S.: 2002 -Middle East Technical University, Turkey

Research Interests: 

Size-Dependent Properties in Metals and Oxides

In Situ X-Ray Diffraction

Residual Stress and Texture Analyes in Thin Films

Chemical Expansion in Complex Oxides

Novel Properties at Interfaces

Publications: 
  • Chen Y., Cai Z., Kuru Y., Electronic Activation of Cathode Superlattices at Elevated Temperatures - Source of Markedly Accelerated Oxygen Reduction Kinetics, Advanced Energy Materials, 3 (2013) 1221-1229
  • Kuru Y, Jalili H, Cai Z, Yildiz B, Tuller HL, Direct Probing of Nano-Dimensioned Oxide Multilayers with Aid of Focused Ion Beam Milling, Advanced Materials, 23 (2011) 4543-4548
  • Cai Z, Kuru Y, Han JW, Chen Y,Yildiz B, Oxygen Vacancy-DrivenSurfaceElectronicStructure on Strained La0.8Sr0.2CoO3ThinFilms at HighTemperature, Journal of the American Chemical Society, 133 (2011) 17696-17704
  • Kuru Y, Bishop SR, Kim JJ, Yildiz B, Tuller HL, ChemomechanicalPropertiesandMicrostructuralStability of NanocrystallinePr-DopedCeria: An InSitu X-Ray DiffractionInvestigation,SolidStateIonics, 193 (2011) 1-4
  • 4.Kuru Y, Wohlschlogel M, Welzel, Mittemeijer EJ, LargeExcessVolume in GrainBoundaries of Stressed, NanocrystallineMetallicThinFilms; ItsEffect on Grain-GrowthKinetics,AppliedPhysicsLetters, 95 (2009) 163112
  • Kuru Y, Wohlschlogel M, Welzel U, Mittemeijer EJ, Non-Ambient X-Ray DiffractionResidualStressAnalysis of ThinFilms: TracingNanosize-RelatedEffects on ThermoelasticConstantsandIdentifiyingSources of ResidualStresses, Journal of AppliedCrystallography, 41 (2008) 428-435
  • Kuru Y, Welzel U, Wohlschlogel M, Mittemeijer EJ, Crystallite Size Dependence of Coefficient of ThermalExpansion in Thin Metal Films, AppliedPhysicsLetters, 90 (2007) 243113